Additional Campus Affiliations
Professor Emeritus, Nuclear, Plasma, and Radiological Engineering
Research Professor, Materials Research Lab
Professor Emeritus, Center for Global Studies
Recent Publications
Lastowski, R. J., Flores, V. J., Souqui, L., Abelson, J. R., & Girolami, G. S. (2024). Compounds with Chelating 3-Dimethylamino-1-propyl Ligands as Chemical Vapor Deposition Precursors. Synthesis and Characterization of M[(CH2)3NMe2]2 Complexes of Nickel(II), Palladium(II), and Platinum(II). Organometallics, 43(20), 2548-2556. https://doi.org/10.1021/acs.organomet.4c00186
Abelson, J. R., Girolami, G. S., Liu, S., Mohimi, E., & Zhang, Z. (2023). Area selective CVD of metallic films using precursor gases and inhibitors. (U.S. Patent No. 11584986).
Canova, K. L., Souqui, L., Girolami, G. S., & Abelson, J. R. (2023). Using metal precursors to passivate oxides for area selective deposition. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 41(3), Article 033407. https://doi.org/10.1116/6.0002413
Lafollette, D. K., Canova, K. L., Zhang, Z. V., & Abelson, J. R. (2022). Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 40(2), Article 023403. https://doi.org/10.1116/6.0001562
Canova, K. L., Zhang, Z. V., Girolami, G. S., & Abelson, J. R. (2021). Superconformal growth and trench filling using a consumable inhibitor in chemical vapor deposition of Hf1-xVxBy. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 39(1), Article 013402. https://doi.org/10.1116/6.0000640