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John R Abelson

Professor Emeritus

Additional Campus Affiliations

Professor Emeritus, Nuclear, Plasma, and Radiological Engineering
Research Professor, Materials Research Lab

Recent Publications

Abelson, J. R., Girolami, G. S., Liu, S., Mohimi, E., & Zhang, Z. (2023). Area Selective Cvd Of Metallic Films Using Precursor Gases And Inhibitors. (U.S. Patent No. 11584986).

Canova, K. L., Souqui, L., Girolami, G. S., & Abelson, J. R. (2023). Using metal precursors to passivate oxides for area selective deposition. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 41(3), Article 033407. https://doi.org/10.1116/6.0002413

Lafollette, D. K., Canova, K. L., Zhang, Z. V., & Abelson, J. R. (2022). Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 40(2), Article 023403. https://doi.org/10.1116/6.0001562

Canova, K. L., Zhang, Z. V., Girolami, G. S., & Abelson, J. R. (2021). Superconformal growth and trench filling using a consumable inhibitor in chemical vapor deposition of Hf1-xVxBy. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 39(1), Article 013402. https://doi.org/10.1116/6.0000640

Yang, Y., Canova, K. L., Jayaraman, S., Kim, D. Y., Girolami, G. S., & Abelson, J. R. (2021). Superconformal chemical vapor deposition using plasma-generated atomic species as a consumable growth inhibitor. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 39(4), Article 043409. https://doi.org/10.1116/6.0001018

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