Additional Campus Affiliations
Professor Emeritus, Nuclear, Plasma, and Radiological Engineering
Research Professor, Materials Research Lab
Recent Publications
Lastowski, R. J., Flores, V. J., Souqui, L., Abelson, J. R., & Girolami, G. S. (Accepted/In press). Compounds with Chelating 3-Dimethylamino-1-propyl Ligands as Chemical Vapor Deposition Precursors. Synthesis and Characterization of M[(CH2)3NMe2]2 Complexes of Nickel(II), Palladium(II), and Platinum(II). Organometallics. https://doi.org/10.1021/acs.organomet.4c00186
Abelson, J. R., Girolami, G. S., Liu, S., Mohimi, E., & Zhang, Z. (2023). Area Selective Cvd Of Metallic Films Using Precursor Gases And Inhibitors. (U.S. Patent No. 11584986).
Canova, K. L., Souqui, L., Girolami, G. S., & Abelson, J. R. (2023). Using metal precursors to passivate oxides for area selective deposition. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 41(3), Article 033407. https://doi.org/10.1116/6.0002413
Lafollette, D. K., Canova, K. L., Zhang, Z. V., & Abelson, J. R. (2022). Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 40(2), Article 023403. https://doi.org/10.1116/6.0001562
Canova, K. L., Zhang, Z. V., Girolami, G. S., & Abelson, J. R. (2021). Superconformal growth and trench filling using a consumable inhibitor in chemical vapor deposition of Hf1-xVxBy. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 39(1), Article 013402. https://doi.org/10.1116/6.0000640